Low pressure gas flow for best gas distributions
DSMC – DIRECT SIMULATION MONTE CARLO
The simulation of low-pressure gas distributions in process chambers requires special numerical methods and a highly computational effort. The DSMC method is applied already in the construction and design phase at VON ARDENNE in order to achieve the best gas distributions.
Plasma process and magnetic field for excellent film growth
PICMC – PARTICLE IN CELL METHOD
Cutting-edge thin-film technology is characterized by film homogeneity, high target utilization, film-optimized process design and other technological requirements. At VON ARDENNE, plasma and magnetic field simulations are used to analyze and improve the decisive physical process responsible for the film growth.
Optical simulation for outstanding film properties
RAY TRACING AND THIN FILM PROPERTIES
Optical simulations are widely used to achieve the most efficient design for VON ARDENNE equipment with flash-lamp based annealing and patterning technology. Furthermore, the parameters of thin films are optimized using simulation methods so that the overall optical properties meet the requirements.
Finite Element Simulations for best coating results
MECHANICAL, THERMAL, CFD, MULTI-PHYSICS
FE simulations for the analysis and optimization of different physical processes in combination with many years of experience are essential prerequisites for VON ARDENNE coating systems to meet the high quality requirements of our customers.