With the DREVA, you get a flexible PVD coating system for the deposition of hard material layers through cathodic arc evaporation.
It also enables you to utilize planar or rotatable magnetron sputter sources extending up to HiPIMS. The evaporators are designed as circular, planar (controlled) ARC evaporation sources.
The hollow cathode plasma source can be used for activation, fine cleaning and heating of the substrates. This is characterised by high discharge currents in the range of >100 A and a correspondingly high plasma density and BIAS currents on the substrates.
The system has fully automatic recipe control, but can also be operated in manual mode. It is supplied with a number of standard recipes for the deposition of hard coatings.
Would you like to learn more? Then take a look at the brochure, or contact us directly.
through cathodic ARC evaporation technology
through modular source configuration
with threefold substrate rotation for 3D parts
