DAS
Dual Anode Sputtering

Dual Anode Sputtering (DAS) is an industrially proven coating technology. It can be applied for ceramic processes with materials such as niobium oxide (NbOx), titanium oxide (TiOx) or intrinsic tin oxide (i-ZnO), for instance in the display and photovoltaics industry. The DAS method guarantees a good availability of the anode as it is cleaned periodically, even when dielectrics are sputtered.

The DAS technology enables us to proceed from the commonly used AC-MF mode to a DC powering of the process, which reduces the heat load on the substrate considerably. With the application of DAS sputtering with reactive process control, high deposition rates in the transition region can be achieved. This is a distinct improvement, especially for the deposition of silicon dioxide (SiO2) and aluminum oxide (AlOx).

Would you like to learn more? Then take a look at the brochure or contact us directly.

Long uptime - even with insulating layers

due to cyclic cleaning of the anode

Flexible arrangement for your system

due to scalable design

Patented technical solution for innovative operation

and for differentiation from market participants

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CONTACT
Trade fairs
29.03.2023 - 31.03.2023
MECSPE 2023

Booth: 14 / E36
Bologna, BolognaFiere

13.04.2023 - 14.04.2023
nPV Workshop Delft 2023

Delft, Technical University

19.04.2023 - 22.04.2023
TiExpo Baoji 2023

Booth: B / 360
Baoji, Exhibition Center

 

25.04.2023 - 26.04.2023
OptecNet Fürstenfeldbruck 2023

Fürstenfeldbruck, Veranstaltungsforum

30.04.2023 - 04.05.2023
SPIE Defense Orlando 2023

Booth: 1621
Orlando, Gaylord Palms Resort & Convention Center

Contact persons
Ronny Borchel

Product Manager Plasma Components VON ARDENNE GmbH