High-Utilization Planar Cathode
for Sputter Processes with Planar Targets

Magnetron sputtering is the proven and most economical method for the deposition of thin optical films in applications such as architectural and automotive glass. The technology was established in the glass industry about 40 years ago.

Its success and industrial breakthrough came with the development of the planar magnetron for large coating widths of up to 3.2 meters.

Today, we can offer you planar cathodes for a variety of applications and and target dimensions. You can rely on our focus always being on highest productivity and best layer properties.

Would you like to know more? Then take a look at the brochure or contact us directly.

Long uptimes

due to highest possible target utilization

Best coating uniformity

in the market

Low target costs compared to cylindrical cathodes

through easier manufacturing method

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CONTACT
27.09.2023 - 28.09.2023
H2 Technology Expo Bremen 2023

Booth: 5H130
Bremen, Messe

01.10.2023 - 04.10.2023
Titanium Denver 2023

Booth:  581
Denver, Gaylord of the Rockies Resort

04.10.2023 - 06.10.2023
REI India 2023

Noida, India Expo Center Greater Noida

16.10.2023 - 19.10.2023
SPIE Optifab Rochester 2023

Rochester, Joseph A. Floreano Riverside Convention Center

05.11.2023 - 11.11.2023
AVS Symposium & Exh. Portland 2023

Portland, Oregon Convention Center

Ronny Borchel

Product Manager Plasma ComponentsVON ARDENNE GmbH

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