High-Utilization Planar Cathode
for Sputter Processes with Planar Targets

Magnetron sputtering is the proven and most economical method for the deposition of thin optical films in applications such as architectural and automotive glass. The technology was established in the glass industry about 40 years ago.

Its success and industrial breakthrough came with the development of the planar magnetron for large coating widths of up to 3.2 meters.

Today, we can offer you planar cathodes for a variety of applications and and target dimensions. You can rely on our focus always being on highest productivity and best layer properties.

Would you like to learn more? Then take a look at the brochure, or contact us directly.

Long uptimes

due to highest possible target utilization

Best coating uniformity

in the market

Low target costs compared to cylindrical cathodes

through easier manufacturing method

No news available.
22.04.2024 - 26.04.2024
H2 FCell Hannovermesse 2024

Booth: nn
Hannover, Messe

25.04.2024 - 28.04.2024
China Glass 2024

Booth: Hall N1 / 126
Shanghai, New International Expo Centre

06.05.2024 - 09.05.2026
SVC Annual Conference 2024

Booth: nn
Chicago Hilton, Illinois, USA

14.05.2024 - 16.05.2024
Optatec Frankfurt 2024

Booth: 318
Messe Frankfurt (1 Halle)

16.05.2024 - 18.05.2024
TiExpo 2024

Booth: A / 099
Suzhou. (The city close to Shanghai)


Ronny Borchel

Product Manager Plasma ComponentsVON ARDENNE GmbH