High-Utilization Planar Cathode
for Sputter Processes with Planar Targets

Magnetron sputtering is the proven and most economical method for the deposition of thin optical films in applications such as architectural and automotive glass. The technology was established in the glass industry about 40 years ago.

Its success and industrial breakthrough came with the development of the planar magnetron for large coating widths of up to 3.2 meters.

Today, we can offer you planar cathodes for a variety of applications and and target dimensions. You can rely on our focus always being on highest productivity and best layer properties.

Would you like to know more? Then take a look at the brochure or contact us directly.

Plasma Components

Long uptimes

due to highest possible target utilization

Best coating uniformity

in the market

Low target costs compared to cylindrical cathodes

through easier manufacturing method

Media

No news available.

CONTACT

Trade fairs

06.06.2023 - 08.06.2023

Tandem PV Workshop Chambéry 2023

Chambéry, Convention Center Le Manège

11.06.2023 - 16.06.2023

IEEE PVSC Conference Puerto Rico 2023

San Juan, Sheraton Puerto Rico Hotel & Casino

14.06.2023 - 16.06.2023

Intersolar Europe 2023

Booth: A2 / 514
München, Messe

20.06.2023 - 22.06.2023

Sensors Converge Santa Clara 2023

Santa Clara, Convention Center

21.06.2023 - 23.06.2023

VIMF 2023

Booth: 152
Binh Duong, World Trade Center Binh Duong New City

Contact persons

Ronny Borchel

Product Manager Plasma Components VON ARDENNE GmbH

High-Utilization Planar Cathode for Sputter Processes with Planar Targets

Long uptimes

Best coating uniformity

Low target costs compared to cylindrical cathodes

High-Utilization Planar Cathode
for Sputter Processes with Planar Targets