High-Utilization Planar Cathode
for Sputter Processes with Planar Targets

Magnetron sputtering is the proven and most economical method for the deposition of thin optical films in applications such as architectural and automotive glass. The technology was established in the glass industry about 40 years ago.

Its success and industrial breakthrough came with the development of the planar magnetron for large coating widths of up to 3.2 meters.

Today, we can offer you planar cathodes for a variety of applications and and target dimensions. You can rely on our focus always being on highest productivity and best layer properties.

Would you like to learn more? Explore the content below or contact us.

Long uptimes

due to highest possible target utilization

Best coating uniformity

in the market

Low target costs compared to cylindrical cathodes

through easier manufacturing method

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CONTACT
07.05.2026 - 09.05.2026
TiExpo 2026

Shanghai, China

National Exhibition and Convention Center

A006

05.07.2026 - 10.07.2026
SPIE Astronomical Telescopes + Instrumentation 2026

Copenhagen, Denmark

02.09.2026 - 04.09.2026
Semicon Taiwan 2026

Taipeh, Taiwan

Silicon Saxony Pavilion

13.10.2026 - 15.10.2026
Semicon West 2026

San Francisco, CA, USA

Moscone Center

North Hall | Booth 5373

SALES Contact

Am Hahnweg 8
01328 Dresden
Germany

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