VON ARDENNE has delivered a sputter cluster system for the new Bosch research campus in Renningen. The CS500SI is a highly flexible seven-chamber cluster system. It is suitable for the processing of customer-specific substrates through RF plasma etching, DC, RF and ion beam sputtering. The RF plasma etching and magnetron sputtering processes are performed in process-down mode.
The system is designed for the special requirements of research and development. It allows for the parallel use of a variety of different coating materials and the production of complex layer systems. The modular concept makes it possible to flexibly adjust the system to changing technological requirements and to integrate new layering technologies in the future.
Bosch will use the CS500SI mainly for the development of MEMS sensors. These microelectromechanical systems (MEMS) are needed, for instance, for a variety of sensors inthe automotive industry.
The cluster design of the system with several process chambers enables the deposition of a multitude of different materials. The flexibility of the system is also increased by the confocal arrangement of the magnetrons. Thus, a separate or parallel deposition of the same or different materials with multiple magnetrons can take place in only one process chamber. The optimized adjustment of the VON ARDENNE magnetrons to the substrate holder and their geometrical arrangement ensure best layer characteristics.
The deposition of metals, which is necessary for creating contact layers, takes place in a separate process chamber. Another process chamber solely serves the sputtering of ceramic materials such as insulators and transparent conductive layers (TCO). A third process chamber is reserved for reactive deposition.
For special, very dense and high-precision layer systems, an ion beam sputtering chamber with a target revolver (for multiple materials) has been integrated into the system. Furthermore, an assisting ion beam source increases the cluster system’s range of use. Further functions for the pre- and post-treatment of the substrates, such as specific temperature control or BIAS treatment, complete the research system.
The CS500SI is another milestone in the close relationship between the two companies since 1996. It is already the third coating system that was especially designed for the Bosch corporate research and advance engineering department. VON ARDENNE is proud to have laid the foundation for the development of future product generations at Bosch with its Equipment solutions.
